磁控溅射参数对SrTiO3基片上沉积YIG薄膜微观结构和磁性能的影响-陕西师范大学学报期刊社网站

陕西师范大学学报（自然科学版）

物理学

磁控溅射参数对SrTiO3基片上沉积YIG薄膜微观结构和磁性能的影响

张运英，杨佳，边小兵，陈晓明，周剑平*

（陕西师范大学物理学与信息技术学院，陕西西安 710119）

周剑平，男，教授，博士生导师。E-mail: zhoujp@snnu.edu.cn

摘要:

采用射频磁控溅射法在SrTiO3衬底上制备YIG薄膜，基于薄膜的成核理论研究溅射参数对薄膜结晶性、表面形貌和磁性的影响。结果表明，在其他溅射参数不变的情况下，薄膜的厚度随溅射时间成正比增长；在衬底温度为500 ℃、溅射气压为1 Pa时，YIG薄膜表面较致密，晶粒大小均匀；沉积薄膜的化学组分受氧分压的影响较大，与靶材成分相比有一定偏差。溅射气体为纯氩气时，YIG薄膜的化学组分与靶材化学计量比接近，制备的YIG薄膜中存在一定量的Fe2+和氧空位；当退火温度为750 ℃时，在氧气中热处理40 min，形成纯的YIG相，饱和磁化强度为134 emu/cm3。

关键词：

射频磁控溅射； YIG薄膜；溅射参数；表面形貌；微观结构；磁性能

收稿日期：

2017-01-19

中图分类号：

G484.1

文献标识码：

文章编号：

1672-4291(2017)05-0023-07

基金项目：

国家自然科学基金（51372148）

Doi:

Micro-structural and magnetic characteristics of YIG thin film prepared on SrTiO3 substrates by RF-magnetron sputtering

ZHANG Yunying， YANG Jia， BIAN Xiaobing, CHEN Xiaoming， ZHOU Jianping*

(School of Physics and Information Technology, Shaanxi Normal University, Xi′an 710119, Shaanxi, China)

Abstract:

YIG thin films were deposited on SrTiO3 substrate by an RF-magnetron sputtering. The crystallization, surface morphology and magnetic property of the thin films were investigated based on the sputtering parameters. The results showed that the film thickness increases in a linear relationship with sputtering time. The YIG film with compact surface and uniform crystalline grains was obtained at deposition temperature of 500 ℃ and sputtering pressure of 1 Pa. The chemical stoichiometry compared with the target material composition has a certain deviation which is relative to the oxygen fraction in sputtering gas. It is shown that O2/Ar ratio of 0∶10 is the best condition to form a stoichiometric YIG film. There are Fe2+ and oxygen vacancies in the deposited film. Pure phase YIG thin film was obtained with high saturation magnetization (Ms) of 134 emu/cm3 after heat treatment in oxygen atmosphere at 750 ℃ for 40 min.

KeyWords:

RF-magnetron sputtering; YIG thin film; sputtering parameters; surface morphology; micro-structure; magnetic property